TitleFundamental Physics of Amorphous Semiconductors : Proceedings of the Kyoto Summer Institute Kyoto, Japan, September 8???11, 1980
Author(s)Yonezawa, F
PublicationBerlin, Heidelberg, Springer Berlin Heidelberg, 1981.
DescriptionVIII, 184 p. 5 illus : online resource
Abstract NoteThe Kyoto Summer Institute 1980 (KSI '80), devoted to "Fundamental Physics of Amorphous Semiconductors", was held at Research Institute for Fundamental Physics (RIFP), Kyoto University, from 8-11 September, 1980. The KSI '80 was the successor of the preceding Institutes which were held in July 1978 on "Particle Physics and Accelerator Projects" and in September 1979 on "Physics of Low-Dimensional Systems". The KSI '80 was attended by 200 participants, of which 36 were from abroad: Canada, France, Korea, Poland, U.K., U.S.A, U.S.S.R., and the Federal Republic of Germany. The KSI '80 was organized by RIFP and directed by the Amorphous Semicon?? ductor group in Japan. A few years ago, we started to organize an interna?? tional meeting on amorphous semiconductors' as a satell ite meeting of the International Conference on "Physics of Semiconductors" held on September 1-5, 1980 in Kyoto. We later decided to hold the meeting in the form of the Kyoto Summer Institute. The Kyoto Summer Institute is aimed to be something between a school and a conference. Accordingly, the object of the KSI '80 was to provide a series of invited lectures and informal seminars on fundamental physics of amorphous semiconductors. No contributed paper was accepted, but seminars were open
ISBN,Price9783642816048
Keyword(s)1. EBOOK 2. EBOOK - SPRINGER 3. Materials???Surfaces 4. Surfaces and Interfaces, Thin Films 5. THIN FILMS
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