TitleX-Ray Microscopy II : Proceedings of the International Symposium, Brookhaven, NY, August 31???September 4, 1987
Author(s)Sayre, David;Howells, Malcolm;Kirz, Janos;Rarback, Harvey
PublicationBerlin, Heidelberg, Springer Berlin Heidelberg, 1988.
DescriptionXIV, 455 p. 288 illus., 2 illus. in color : online resource
Abstract NoteThis volume is based on papers presented at the International Symposium on X-Ray Microscopy held at Brookhaven National Laboratory, Upton NY, August 31-September 4, 1987. Previous recent symposia on the sub?? ject were held in New York in 1979, Gottingen in 1983 and Taipei in 1986. Developments in x-ray microscopy continue at a rapid pace, with im?? portant advances in all major areas: x-ray sources, optics and components, and microscopes and imaging systems. Taken as a whole, the work pre?? sented here emphasizes three major directions: (a) improvements in the capability and image-quality of x-ray microscopy, expressed principally in systems attached to large, high-brightness x-ray sources; (b) greater access to x-ray microscopy, expressed chiefly in systems employing small, often pulsed, x-ray sources; and (c) increased rate of exploration of applications of x-ray microscopy. The number of papers presented at the symposium has roughly dou?? bled compared with that of its predecessors. While we are delighted at this growth as a manifestation of vitality and rapid growth of the field, we did have to ask the authors to limit the length of their papers and to submit them in camera-ready form. We thank the authors for their con?? tributions and for their efforts in adhering to the guidelines on manuscript preparation
ISBN,Price9783540392460
Keyword(s)1. EBOOK 2. EBOOK - SPRINGER 3. LASERS 4. Optics, Lasers, Photonics, Optical Devices 5. PHOTONICS
Item TypeeBook
Multi-Media Links
Please Click here for eBook
Circulation Data
Accession#  Call#StatusIssued ToReturn Due On Physical Location
I04542     On Shelf