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Author | Title | Accn# | Year | Item Type | Claims |
| 1 |
Behrisch, Rainer |
Sputtering by Particle Bombardment |
I06420 |
2007 |
eBook |
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| 2 |
Behrisch, Rainer |
Sputtering by Particle Bombardment III |
I04630 |
1991 |
eBook |
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| Title | Sputtering by Particle Bombardment : Experiments and Computer Calculations from Threshold to MeV Energies |
| Author(s) | Behrisch, Rainer;Eckstein, Wolfgang |
| Publication | Berlin, Heidelberg, Springer Berlin Heidelberg, 2007. |
| Description | XVII, 509 p : online resource |
| Abstract Note | This volume gives a comprehensive overview about the physical processes causing sputtering of solids at bombardment with energetic ions. The most important quantities are the sputtering yields, i.e. the average number of atoms eroded per incident ion. The latest results for the sputtering yields and their dependence on the incident energy and angle of incidence, as well as the energy and angular distributions of the sputtered atoms are presented. This concerns experimentally determined yields as well as a critical evaluation of the computational methods used to calculate the yields and distributions. The energies of the incident ions cover the range between a few eV up to several MeV. The influence of chemical effects between the incident ions and the atoms of the bombarded solid on the sputtering yields are also reviewed |
| ISBN,Price | 9783540445029 |
| Keyword(s) | 1. ATOMS
2. Atoms and Molecules in Strong Fields, Laser Matter Interaction
3. EBOOK
4. EBOOK - SPRINGER
5. Materials???Surfaces
6. PHYSICS
7. PLASMA (IONIZED GASES)
8. PLASMA PHYSICS
9. Surfaces and Interfaces, Thin Films
10. THIN FILMS
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| Item Type | eBook |
Multi-Media Links
Please Click here for eBook
Circulation Data
| Accession# | |
Call# | Status | Issued To | Return Due On | Physical Location |
| I06420 |
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On Shelf |
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2.
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| Title | Sputtering by Particle Bombardment III : Characteristics of Sputtered Particles, Technical Applications |
| Author(s) | Behrisch, Rainer;Wittmaack, Klaus |
| Publication | Berlin, Heidelberg, Springer Berlin Heidelberg, 1991. |
| Description | XV, 415 p. 66 illus : online resource |
| Abstract Note | Sputtering, the ejection of atoms or groups of atoms from the surface of a solid bombarded by energetic particles, is a widely observed phenomenon that has many applications in today's experimental physics and technology. This is the third and final volume of a comprehensive review on sputtering. Whereas the first two volumes deal primarily with physical aspects such as the theory of sputtering, experimentally observed sputtering yields and surface topography changes, this volume is devoted to the characteristic properties of the sputtered particles and technological applications of sputtering. The particles are characterized by their energy, mass, and angular distributions, along with their charge and excitation states, while the applications described in- clude surface and depth analysis, micromachining, and the production of surface coatings and thin films. As in the previous two volumes, the various chapters have been written by the main authorities in the field. The book addresses a broad audience: scientists active in the field will find the overview and background information they have long been seeking, while students and new comers to surface science and materials science will find a readable introduction to sputtering |
| ISBN,Price | 9783540468813 |
| Keyword(s) | 1. EBOOK
2. EBOOK - SPRINGER
3. ENGINEERING
4. Engineering, general
5. Materials???Surfaces
6. MICROSCOPY
7. SOLID STATE PHYSICS
8. SPECTROSCOPY
9. Spectroscopy and Microscopy
10. Surfaces and Interfaces, Thin Films
11. THIN FILMS
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| Item Type | eBook |
Multi-Media Links
Please Click here for eBook
Circulation Data
| Accession# | |
Call# | Status | Issued To | Return Due On | Physical Location |
| I04630 |
|
|
On Shelf |
|
|
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