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Author | Title | Accn# | Year | Item Type | Claims |
| 1 |
Chen, Francis F |
Lecture Notes on Principles of Plasma Processing |
I10613 |
2003 |
eBook |
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| 2 |
Chen, Francis F |
Introduction to Plasma Physics |
I03383 |
1974 |
eBook |
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| 3 |
Chen, Francis F |
Introduction to Plasma Physics and Controlled Fusion |
I00638 |
1984 |
eBook |
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1.
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| Title | Lecture Notes on Principles of Plasma Processing |
| Author(s) | Chen, Francis F;Chang, Jane P |
| Publication | New York, NY, Springer US, 2003. |
| Description | XI, 208 p. 177 illus : online resource |
| Abstract Note | Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry |
| ISBN,Price | 9781461501817 |
| Keyword(s) | 1. CHEMICAL ENGINEERING
2. EBOOK
3. EBOOK - SPRINGER
4. Electronic materials
5. Heavy ions
6. Industrial Chemistry/Chemical Engineering
7. NUCLEAR PHYSICS
8. Nuclear Physics, Heavy Ions, Hadrons
9. Optical and Electronic Materials
10. OPTICAL MATERIALS
|
| Item Type | eBook |
Multi-Media Links
Please Click here for eBook
Circulation Data
| Accession# | |
Call# | Status | Issued To | Return Due On | Physical Location |
| I10613 |
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On Shelf |
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2.
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| Title | Introduction to Plasma Physics |
| Author(s) | Chen, Francis F |
| Publication | New York, NY, Springer US, 1974. |
| Description | XII, 330 p. 51 illus : online resource |
| Abstract Note | This book grew out of lecture notes for an undergraduate course in plasma physics that has been offered for a number of years at UCLA. With the current increase in interest in controlled fusion and the wide?? spread use of plasma physics in space research and relativistic as?? trophysics, it makes sense for the study of plasmas to become a part of an undergraduate student's basic experience, along with subjects like thermodynamics or quantum mechanics. Although the primary purpose of this book was to fulfill a need for a text that seniors or juniors can really understand, I hope it can also serve as a painless way for scientists in other fields-solid state or laser physics, for instance?? to become acquainted with plasmas. Two guiding principles were followed: Do not leave algebraic steps as an exercise for the reader, and do not let the algebra obscure the physics. The extent to which these opposing aims could be met is largely due to the treatment of a plasma as two interpenetrating fluids. The two-fluid picture is both easier to understand and more accurate than the single-fluid approach, at least for low-density plasma phe?? nomena |
| ISBN,Price | 9781475704594 |
| Keyword(s) | 1. Characterization and Evaluation of Materials
2. EBOOK
3. EBOOK - SPRINGER
4. MATERIALS SCIENCE
5. PLASMA (IONIZED GASES)
6. PLASMA PHYSICS
|
| Item Type | eBook |
Multi-Media Links
Please Click here for eBook
Circulation Data
| Accession# | |
Call# | Status | Issued To | Return Due On | Physical Location |
| I03383 |
|
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On Shelf |
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3.
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| Title | Introduction to Plasma Physics and Controlled Fusion : Volume 1: Plasma Physics |
| Author(s) | Chen, Francis F |
| Publication | New York, NY, Springer US, 1984. |
| Description | XVII, 421 p : online resource |
| Abstract Note | This complete introduction to plasma physics and controlled fusion by one of the pioneering scientists in this expanding field offers both a simple and intuitive discussion of the basic concepts of this subject and an insight into the challenging problems of current research. In a wholly lucid manner the work covers single-particle motions, fluid equations for plasmas, wave motions, diffusion and resistivity, Landau damping, plasma instabilities and nonlinear problems. For students, this outstanding text offers a painless introduction to this important field; for teachers, a large collection of problems; and for researchers, a concise review of the fundamentals as well as original treatments of a number of topics never before explained so clearly. This revised edition contains new material on kinetic effects, including Bernstein waves and the plasma dispersion function, and on nonlinear wave equations and solitons |
| ISBN,Price | 9781475755954 |
| Keyword(s) | 1. Atomic, Molecular, Optical and Plasma Physics
2. ATOMS
3. Atoms and Molecules in Strong Fields, Laser Matter Interaction
4. CLASSICAL ELECTRODYNAMICS
5. EBOOK
6. EBOOK - SPRINGER
7. ELECTRODYNAMICS
8. ENGINEERING
9. Engineering, general
10. OPTICS
11. PHYSICS
12. PLASMA (IONIZED GASES)
13. PLASMA PHYSICS
14. SPACE SCIENCES
15. Space Sciences (including Extraterrestrial Physics, Space Exploration and Astronautics)
|
| Item Type | eBook |
Multi-Media Links
Please Click here for eBook
Circulation Data
| Accession# | |
Call# | Status | Issued To | Return Due On | Physical Location |
| I00638 |
|
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On Shelf |
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