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Click the serial number on the left to view the details of the item. |
| # |
Author | Title | Accn# | Year | Item Type | Claims |
| 521 |
Luy, Johann-Friedrich |
Silicon-Based Millimeter-Wave Devices |
I01427 |
1994 |
eBook |
|
| 522 |
M??ller-Warmuth, W |
Progress in Intercalation Research |
I01284 |
1994 |
eBook |
|
| 523 |
Vasko, Fedor T |
Electronic States and Optical Transitions in Semiconductor Heterostructures |
I01077 |
1999 |
eBook |
|
| 524 |
Heinrich, Helmut |
Physics and Technology of Submicron Structures |
I00998 |
1988 |
eBook |
|
| 525 |
Hadjipanayis, G.C |
Science and Technology of Nanostructured Magnetic Materials |
I00985 |
1991 |
eBook |
|
| 526 |
Seeger, Karlheinz |
Semiconductor Physics |
I00893 |
1997 |
eBook |
|
| 527 |
Tsytovich, Vadim N |
Lectures on Non-linear Plasma Kinetics |
I00796 |
1995 |
eBook |
|
| 528 |
Shur, Michael S |
GaAs Devices and Circuits |
I00773 |
1987 |
eBook |
|
| 529 |
Adler, David |
Physical Properties of Amorphous Materials |
I00746 |
1985 |
eBook |
|
| 530 |
Moreau, Wayne M |
Semiconductor Lithography |
I00728 |
1988 |
eBook |
|
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|
521.
  |
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| Title | Silicon-Based Millimeter-Wave Devices |
| Author(s) | Luy, Johann-Friedrich;Russer, Peter |
| Publication | Berlin, Heidelberg, Springer Berlin Heidelberg, 1994. |
| Description | XVI, 343 p : online resource |
| Abstract Note | Silicon-Based Millimeter-Wave Devices describes field-theoretical methods for the design and analysis of planar waveguide structures and antennas. The principles and limitations of transit-time devices with different injection mechanisms are discussed, as are aspects of fabrication and characterization. The physical properties of silicon Schottky contacts and diodes are treated in a separate chapter. Two chapters cover the silicon/germanium devices: physics and RF properties of the heterobipolar transistor and quantum effect devices such as the resonant tunneling element are described. The integration of devices in monolithic circuits is explained and advanced technologies are presented along with the self-mixing oscillator operation. Finally sensor and system applications are considered |
| ISBN,Price | 9783642790317 |
| Keyword(s) | 1. Communications Engineering, Networks
2. EBOOK
3. EBOOK - SPRINGER
4. ELECTRICAL ENGINEERING
5. Electronic materials
6. ELECTRONICS
7. Electronics and Microelectronics, Instrumentation
8. MICROELECTRONICS
9. Optical and Electronic Materials
10. OPTICAL MATERIALS
|
| Item Type | eBook |
Multi-Media Links
Please Click here for eBook
Circulation Data
| Accession# | |
Call# | Status | Issued To | Return Due On | Physical Location |
| I01427 |
|
|
On Shelf |
|
|
|
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522.
 |
|
| Title | Progress in Intercalation Research |
| Author(s) | M??ller-Warmuth, W;Sch??llhorn, R |
| Publication | Dordrecht, Springer Netherlands, 1994. |
| Description | XIV, 514 p : online resource |
| Abstract Note | The combination of solid materials of different structural dimensionality with atomic or molecular guest species via intercalation processes represents a unique and widely variable low temperature synthesis strategy for the design of solids with particular composition, structure and physical properties. In the last decade this field has experienced a rapid development and represents now an established specific domain of solid state research and materials science. Substantial progress has been made with respect to an understanding of the complex relationship between structure, bonding, physical properties and chemical reactivity since the first volume on the subject appeared in this series in 1979 (Intercalated Layered Materials, F. Levy, ed.). The purpose of this volume is to present a survey on progress and per?? spectives based on the treatment of a series of major areas of activities in this field. By the very nature of its subject this monograph has an interdisciplinary character and addresses itself to chemists, physicists and materials scien?? tists interested in intercalation research and related aspects such as design and characterization of complex materials, low temperature synthesis, solid state reaction mechanisms, electronic/ionic conductivity, control of electronic properties of solids with different structural dimensionality and application of intercalation systems. Several chapters have been devoted to specific groups of host lattices |
| ISBN,Price | 9789401108904 |
| Keyword(s) | 1. Analytical chemistry
2. Characterization and Evaluation of Materials
3. EBOOK
4. EBOOK - SPRINGER
5. Electronic materials
6. MATERIALS SCIENCE
7. Optical and Electronic Materials
8. OPTICAL MATERIALS
|
| Item Type | eBook |
Multi-Media Links
Please Click here for eBook
Circulation Data
| Accession# | |
Call# | Status | Issued To | Return Due On | Physical Location |
| I01284 |
|
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On Shelf |
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523.
|
|
| Title | Electronic States and Optical Transitions in Semiconductor Heterostructures |
| Author(s) | Vasko, Fedor T;Kuznetsov, Alex V |
| Publication | New York, NY, Springer New York, 1999. |
| Description | VII, 401 p : online resource |
| Abstract Note | The study of semiconductor heterostructures started more than forty years ago. In the 1980s this area of research moved to the forefront of semiconduc?? tor physics, largely due to progress in growth technologies which are now capable of producing ultrathin layers (up to a few monolayers) of different semiconductor materials. The availability of structures with nearly ideal, well-controlled properties has made semiconductor heterostructures a test?? ing ground for solid-state physics. These structures have had a profound impact on basic research in semiconductor physics by opening new possibil?? ities for studying low-dimensional electrons, as well as the atomic and elec?? tronic properties of interfaces. Semiconductor heterostructures have also a variety of important practical applications: they provide a material basis for a number of novel devices, and also open the way for improving the operating characteristics of traditional micro- and optoelectronic compo?? nents. As a result of the growing importance of heterostructure physics, more and more people are entering this dynamic field, either from graduate school or from other areas of research. For the new entrants, the task of familiariz?? ing themselves with the vast body of existing knowledge about heterostruc?? tures has become quite a challenge, due to the rapid development of the field and its increasing subdivision into distinct subfields. Even for those who already work in one area of heterostructure physics, keeping up with the developments in neighboring areas is not an easy task. The purpose of this book is to make heterostructure physics more accessible |
| ISBN,Price | 9781461205357 |
| Keyword(s) | 1. EBOOK
2. EBOOK - SPRINGER
3. Electronic materials
4. Optical and Electronic Materials
5. OPTICAL MATERIALS
|
| Item Type | eBook |
Multi-Media Links
Please Click here for eBook
Circulation Data
| Accession# | |
Call# | Status | Issued To | Return Due On | Physical Location |
| I01077 |
|
|
On Shelf |
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524.
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| Title | Physics and Technology of Submicron Structures : Proceedings of the Fifth International Winter School, Mauterndorf, Austria, February 22???26, 1988 |
| Author(s) | Heinrich, Helmut;Neubauer, G??nther;Kuchar, Friedemar |
| Publication | Berlin, Heidelberg, Springer Berlin Heidelberg, 1988. |
| Description | X, 287 p : online resource |
| Abstract Note | This volume presents a discussion of the latest results in the physics of low-dimensional structures. At the winter school major breakthroughs were reported, and some of the excitement of the participants is reflected in the contributions. The topics treated range from the fabrication of microstructures and the physical background of future semiconductor devices to vertical transport in nanostructures, universal conductance fluctuations, and the transition from two-dimensional to one-dimensional conduction in semiconductor structures |
| ISBN,Price | 9783642834318 |
| Keyword(s) | 1. EBOOK
2. EBOOK - SPRINGER
3. Electronic materials
4. Optical and Electronic Materials
5. OPTICAL MATERIALS
|
| Item Type | eBook |
Multi-Media Links
Please Click here for eBook
Circulation Data
| Accession# | |
Call# | Status | Issued To | Return Due On | Physical Location |
| I00998 |
|
|
On Shelf |
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526.
|
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| Title | Semiconductor Physics : An Introduction |
| Author(s) | Seeger, Karlheinz |
| Publication | Berlin, Heidelberg, Springer Berlin Heidelberg, 1997. |
| Description | XII, 515 p : online resource |
| Abstract Note | Semiconductor Physics - An Introduction - is suitable for the senior undergraduate or new graduate student majoring in electrical engineering or physics. It will also be useful to solid-state scientists and device engineers involved in semiconductor design and technology. The text provides a lucid account of charge transport, energy transport and optical processes, and a detailed description of many devices. It includes sections on superlattices and quantum well structures, the effects of deep-level impurities on transport, the quantum Hall effect and the calculation of the influence of a magnetic field on the carrier distribution function. This 6th edition has been revised and corrected, and new sections have been added to different chapters |
| ISBN,Price | 9783662033470 |
| Keyword(s) | 1. EBOOK
2. EBOOK - SPRINGER
3. Electronic materials
4. ELECTRONICS
5. Electronics and Microelectronics, Instrumentation
6. Materials???Surfaces
7. MICROELECTRONICS
8. Optical and Electronic Materials
9. OPTICAL MATERIALS
10. Surfaces and Interfaces, Thin Films
11. THIN FILMS
|
| Item Type | eBook |
Multi-Media Links
Please Click here for eBook
Circulation Data
| Accession# | |
Call# | Status | Issued To | Return Due On | Physical Location |
| I00893 |
|
|
On Shelf |
|
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|
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527.
|
|
| Title | Lectures on Non-linear Plasma Kinetics |
| Author(s) | Tsytovich, Vadim N |
| Publication | Berlin, Heidelberg, Springer Berlin Heidelberg, 1995. |
| Description | XI, 376 p : online resource |
| Abstract Note | Lectures on Nonlinear Plasma Kinetics is an introduction to modern non-linear plasma physics showing how many of the techniques of modern non-linear physics find applications in plasma physics and how, in turn, the results of this research find applications in astrophysics. Emphasis is given to explaining the physics of nonlinear processes and the radical change of cross-sections by collective effects. The author discusses new nonlinear phenomena involving the excitation of coherent nonlinear structures and the dynamics of their random motions in relation to new self-organization processes. He also gives a detailed description of applications of the general theory to various research fields, including the interaction of powerful radiation with matter, collective laser particle accelerators, controlled thermonuclear research, space physics, solar physics, and astrophysics |
| ISBN,Price | 9783642789021 |
| Keyword(s) | 1. Atomic, Molecular, Optical and Plasma Physics
2. ATOMS
3. COMPLEX SYSTEMS
4. DYNAMICAL SYSTEMS
5. EBOOK
6. EBOOK - SPRINGER
7. Electronic materials
8. Optical and Electronic Materials
9. OPTICAL MATERIALS
10. PHYSICS
11. SPACE SCIENCES
12. Space Sciences (including Extraterrestrial Physics, Space Exploration and Astronautics)
13. STATISTICAL PHYSICS
14. Statistical Physics and Dynamical Systems
15. THERMODYNAMICS
|
| Item Type | eBook |
Multi-Media Links
Please Click here for eBook
Circulation Data
| Accession# | |
Call# | Status | Issued To | Return Due On | Physical Location |
| I00796 |
|
|
On Shelf |
|
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528.
|
|
| Title | GaAs Devices and Circuits |
| Author(s) | Shur, Michael S |
| Publication | New York, NY, Springer US, 1987. |
| Description | XIV, 670 p : online resource |
| Abstract Note | GaAs devices and integrated circuits have emerged as leading contenders for ultra-high-speed applications. This book is intended to be a reference for a rapidly growing GaAs community of researchers and graduate students. It was written over several years and parts of it were used for courses on GaAs devices and integrated circuits and on heterojunction GaAs devices developed and taught at the University of Minnesota. Many people helped me in writing this book. I would like to express my deep gratitude to Professor Lester Eastman of Cornell University, whose ideas and thoughts inspired me and helped to determine the direction of my research work for many years. I also benefited from numerous discussions with his students and associates and from the very atmosphere of the pursuit of excellence which exists in his group. I would like to thank my former and present co-workers and colleagues-Drs. Levinstein and Gelmont of the A. F. Ioffe Institute of Physics and Technology, Professor Melvin Shaw of Wayne State University, Dr. Kastalsky of Bell Communi?? cations, Professor Gary Robinson of Colorado State University, Professor Tony Valois, and Dr. Tim Drummond of Sandia Labs-for their contributions to our joint research and for valuable discussions. My special thanks to Professor Morko.;, for his help, his ideas, and the example set by his pioneering work. Since 1978 I have been working with engineers from Honeywell, Inc.-Drs |
| ISBN,Price | 9781489919892 |
| Keyword(s) | 1. EBOOK
2. EBOOK - SPRINGER
3. ELECTRICAL ENGINEERING
4. Electronic materials
5. Optical and Electronic Materials
6. OPTICAL MATERIALS
|
| Item Type | eBook |
Multi-Media Links
Please Click here for eBook
Circulation Data
| Accession# | |
Call# | Status | Issued To | Return Due On | Physical Location |
| I00773 |
|
|
On Shelf |
|
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530.
| |
| Title | Semiconductor Lithography : Principles, Practices, and Materials |
| Author(s) | Moreau, Wayne M |
| Publication | New York, NY, Springer US, 1988. |
| Description | 952 p : online resource |
| Abstract Note | Semiconductor lithography is one of the key steps in the manufacturing of integrated silicon-based circuits. In fabricating a semiconductor device such as a transistor, a series of hot processes consisting of vacuum film deposition, oxidations, and dopant implantation are all patterned into microscopic circuits by the wet processes of lithography. Lithography, as adopted by the semiconductor industry, is the process of drawing or printing the pattern of an integrated circuit in a resist material. The pattern is formed and overlayed to a previous circuit layer as many as 30 times in the manufacture of logic and memory devices. With the resist pattern acting as a mask, a permanent device structure is formed by subtractive (removal) etching or by additive deposition of metals or insulators. Each process step in lithography uses inorganic or organic materials to physically transform semiconductors of silicon, insulators of oxides, nitrides, and organic polymers, and metals, into useful electronic devices. All forms of electromagnetic radiation are used in the processing. Lithography is a mUltidisciplinary science of materials, processes, and equipment, interacting to produce three-dimensional structures. Many aspects of chemistry, electrical engineering, materials science, and physics are involved. The purpose of this book is to bring together the work of many scientists and engineers over the last 10 years and focus upon the basic resist materials, the lithographic processes, and the fundamental principles behind each lithographic process |
| ISBN,Price | 9781461308850 |
| Keyword(s) | 1. EBOOK
2. EBOOK - SPRINGER
3. ELECTRICAL ENGINEERING
4. Electronic materials
5. Optical and Electronic Materials
6. OPTICAL MATERIALS
|
| Item Type | eBook |
Multi-Media Links
Please Click here for eBook
Circulation Data
| Accession# | |
Call# | Status | Issued To | Return Due On | Physical Location |
| I00728 |
|
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On Shelf |
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